화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Characterization of titanium oxynitride films deposited by low pressure chemical vapor deposition using amide Ti precursor
Song XM, Gopireddy D, Takoudis CG
Thin Solid Films, 516(18), 6330, 2008
2 Tetrakis(diethylamido) titanium (TDEAT) interactions with SiO2 and Cu substrates
Tong J, Magtoto N, Kelber J
Applied Surface Science, 220(1-4), 203, 2003
3 REMOTE PLASMA ENHANCED METAL ORGANIC CHEMI- CAL VAPOR DEPOSITION OF TiN FOR DIFFUSION BARRIER
Yun JY, Rhee SW
Korean Journal of Chemical Engineering, 13(5), 510, 1996