화학공학소재연구정보센터
검색결과 : 13건
No. Article
1 Titanium oxynitride thin films sputter deposited by the reactive gas pulsing process
Chappe JM, Martin N, Lintymer J, Sthal F, Terwagne G, Takadoum J
Applied Surface Science, 253(12), 5312, 2007
2 Substrate temperature and water vapour effects on structural and mechanical properties of TiOxNy coatings
Chappe JM, Gavoille J, Martin N, Lintymer J, Takadoum J
Journal of Materials Science, 41(17), 5639, 2006
3 Structure and tribological properties of reactively sputtered Zr-Si-N films
Pilloud D, Pierson JF, Takadoum J
Thin Solid Films, 496(2), 445, 2006
4 Modeling of Young's modulus, hardness and stiffness of chromium zigzag multilayers sputter deposited
Lintymer J, Martin N, Chappe JM, Takadoum J, Delobelle P
Thin Solid Films, 503(1-2), 177, 2006
5 Influence of substrate temperature on titanium oxynitride thin films prepared by reactive sputtering
Chappe JM, Martin N, Pierson JF, Terwagne G, Lintymer J, Gavoille J, Takadoum J
Applied Surface Science, 225(1-4), 29, 2004
6 Modifications of polypropylene surface properties by He+ ion implantation
Brun C, Fromm M, Berger F, Delobelle P, Takadoum J, Beche E, Chambaudet A, Jaffiol F
Journal of Polymer Science Part B: Polymer Physics, 41(11), 1183, 2003
7 Water as reactive gas to prepare titanium oxynitride thin films by reactive sputtering
Chappe JM, Martin N, Terwagne G, Lintymer J, Gavoille J, Takadoum J
Thin Solid Films, 440(1-2), 66, 2003
8 Study of surface forces dependence on pH by atomic force microscopy
Gavoille J, Takadoum J
Journal of Colloid and Interface Science, 250(1), 104, 2002
9 Nitrogen pulsing to modify the properties of titanium nitride thin films sputter deposited
Martin N, Lintymer J, Gavoille J, Takadoum J
Journal of Materials Science, 37(20), 4327, 2002
10 Correlation between processing and properties of TiOxNy thin films sputter deposited by the reactive gas pulsing technique
Martin N, Banakh O, Santo AME, Springer S, Sanjines R, Takadoum J, Levy F
Applied Surface Science, 185(1-2), 123, 2001