화학공학소재연구정보센터
검색결과 : 6건
No. Article
1 Smooth sidewall in InP-based photonic crystal membrane etched by N-2-based inductively coupled plasma
Lee KH, Guilet S, Patriarche G, Sagnes I, Talneau A
Journal of Vacuum Science & Technology B, 26(4), 1326, 2008
2 Modeling of the chemically assisted ion beam etching process: Application to the GaAs etching by Cl-2/Ar+
Elmonser L, Rhallabi A, Gaillard M, Landesman JP, Talneau A, Pommereau F, Bouadma N
Journal of Vacuum Science & Technology A, 25(1), 126, 2007
3 Characterization of the feature-size dependence in Ar/Cl-2 chemically assisted ion beam etching of InP-based photonic crystal devices
Berrier A, Mulot M, Anand S, Talneau A, Ferrini R, Houdre R
Journal of Vacuum Science & Technology B, 25(1), 1, 2007
4 Development of chemically assisted etching method for GaAs-based optoelectronic devices
Gaillard M, Rhallabi A, Elmonser L, Talneau A, Pommereau F, Pagnod-Rossiaux P, Bouadma N
Journal of Vacuum Science & Technology A, 23(2), 256, 2005
5 Chemically assisted ion beam etching of GaAs by argon and chlorine gases: Experimental and simulation investigations
Rhallabi A, Gaillard M, Elmonser L, Marcos G, Talneau A, Pommereau F, Pagnod-Rossiaux P, Landesman JP, Bouadma N
Journal of Vacuum Science & Technology B, 23(5), 1984, 2005
6 Low-loss InP-based photonic-crystal waveguides etched with Ar/Cl-2 chemically assisted ion beam etching
Mulot M, Anand S, Swillo M, Qiu M, Jaskorzynska B, Talneau A
Journal of Vacuum Science & Technology B, 21(2), 900, 2003