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| No. | Article |
|---|---|
| 1 |
Understanding of boron junction stability in preamorphized silicon after optimized flash annealing Yeong SH, Colombeau B, Poon CH, Mok KRC, See A, Benistant F, Tan DXM, Pey KL, Ng CM, Chan L, Srinivasan MP Journal of the Electrochemical Society, 155(7), H508, 2008 |