1 |
Effects of annealing pressure and Ar+ sputtering cleaning on Al-doped ZnO films Wang JW, Mei Y, Lu XM, Fan XX, Kang DW, Xu PF, Tan TY Applied Surface Science, 387, 779, 2016 |
2 |
Stereospecific Cross Couplings To Set Benzylic, All-Carbon Quaternary Stereocenters in High Enantiopurity Zhou Q, Cobb KM, Tan TY, Watson MP Journal of the American Chemical Society, 138(37), 12057, 2016 |
3 |
Fabrication of colloidal photonic crystal heterostructures free of interface imperfection based on solvent vapor annealing Liu XM, Zhao DB, Geng C, Zhang LJ, Tan TY, Hu MZ, Yan QF Journal of Colloid and Interface Science, 434, 98, 2014 |
4 |
Thermal stability of titanium nitride coatings prepared by the mixing technology with laser and plasma Yu HJ, Tan TY, Wu W, Tian C, An Y, Sun FJ Current Applied Physics, 12(1), 152, 2012 |
5 |
Preparation of High-Quality Colloidal Mask for Nanosphere Lithography by a Combination of Air/Water Interface Self-Assembly and Solvent Vapor Anneallng Yu J, Geng C, Zheng L, Ma ZH, Tan TY, Wang XQ, Yan QF, Shen DZ Langmuir, 28(34), 12681, 2012 |
6 |
What the Theory Says about the Six Layer Periodic Structures in Antiferroelectric Liquid Crystals? Tan TY, Ong LH, Cepic M Molecular Crystals and Liquid Crystals, 540, 69, 2011 |
7 |
A simple analytical model to accurately predict self-resonance frequencies of on-silicon-chip inductors in TEM mode and eddy current mode Guo JC, Tan TY Solid-State Electronics, 52(8), 1225, 2008 |
8 |
Crystallization of amorphous SiO2 microtubes catalyzed by lithium Zhao LL, Li N, Langner A, Steinhart M, Tan TY, Pippel E, Hofmeister H, Tu KN, Gosele U Advanced Functional Materials, 17(12), 1952, 2007 |
9 |
Extended high temperature Al gettering for improvement and homogenization of minority carrier diffusion lengths in multicrystalline Si Joshi SM, Gosele UM, Tan TY Solar Energy Materials and Solar Cells, 70(2), 231, 2001 |
10 |
A Simple Chemical Treatment for Preventing Thermal Bubbles in Silicon-Wafer Bonding Tong QY, Kaido G, Tong L, Reiche M, Shi F, Steinkirchner J, Tan TY, Gosele U Journal of the Electrochemical Society, 142(10), L201, 1995 |