검색결과 : 1건
| No. | Article |
|---|---|
| 1 |
Etching of silicon nitride in CCl2F2, CHF3, SiF4, and SF6 reactive plasma: A comparative study Pant BD, Tandon US Plasma Chemistry and Plasma Processing, 19(4), 545, 1999 |
| No. | Article |
|---|---|
| 1 |
Etching of silicon nitride in CCl2F2, CHF3, SiF4, and SF6 reactive plasma: A comparative study Pant BD, Tandon US Plasma Chemistry and Plasma Processing, 19(4), 545, 1999 |