화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Vertical distribution of lattice strain in polycrystalline silicon films grown on silicon dioxide
Tanikawa A
Journal of the Electrochemical Society, 148(8), G406, 2001
2 Strain near SiO2-Si interface revealed by X-ray diffraction intensity enhancement
Emoto T, Akimoto K, Ishikawa Y, Ichimiya A, Tanikawa A
Thin Solid Films, 369(1-2), 281, 2000
3 (100) Oriented Poly-Si Film Grown by Ultrahigh-Vacuum Chemical-Vapor-Deposition
Tanikawa A, Tatsumi T
Journal of the Electrochemical Society, 141(10), 2848, 1994