검색결과 : 10건
| No. | Article |
|---|---|
| 1 |
Silicon based MIS photoanode for water oxidation: A comparison of RuO2 and Ni Schottky contacts Mikolasek M, Frohlich K, Husekova K, Racko J, Rehacek V, Chymo F, Tapajna M, Harmatha L Applied Surface Science, 461, 48, 2018 |
| 2 |
Characterization of interface states in AlGaN/GaN metal-oxide-semiconductor heterostructure field-effect transistors with HfO2 gate dielectric grown by atomic layer deposition Stoklas R, Gregusova D, Hasenohrl S, Brytavskyi E, Tapajna M, Frohlich K, Hascik S, Gregor M, Kuzmik J Applied Surface Science, 461, 255, 2018 |
| 3 |
Investigation of 'surface donors' in Al2O3/AlGaN/GaN metal-oxide-semiconductor heterostructures: Correlation of electrical, structural, and chemical properties Tapajna M, Stoklas R, Gregusova D, Gucmann F, Husekova K, Hascik S, Frohlich K, Toth L, Pecz B, Brunner F, Kuzmik J Applied Surface Science, 426, 656, 2017 |
| 4 |
Structural and dielectric properties of Ru-based gate/Hf-doped Ta2O5 stacks Paskaleva A, Tapajna M, Dobrocka E, Husekova K, Atanassova E, Frohlich K Applied Surface Science, 257(17), 7876, 2011 |
| 5 |
Epitaxial growth of high-kappa TiO2 rutile films on RuO2 electrodes Frohlich K, Aarik J, Tapajna M, Rosova A, Aidla A, Dobrocka E, Huskova K Journal of Vacuum Science & Technology B, 27(1), 266, 2009 |
| 6 |
Effect of Ti doping on Ta2O5 stacks with Ru and Al gates Paskaleva A, Tapajna M, Atanassova E, Frohlich K, Vincze A, Dobrocka E Applied Surface Science, 254(18), 5879, 2008 |
| 7 |
Growth of high-dielectric-constant TiO2 films in capacitors with RuO2 electrodes Frohlich K, Tapajna M, Rosova A, Dobrocka E, Husekova K, Aarik J, Aidla A Electrochemical and Solid State Letters, 11(6), G19, 2008 |
| 8 |
Properties of Ru/HfxSi1-xOy/Si metal oxide semiconductor gate stack structures grown by atomic vapor deposition Frohlich K, Luptak R, Husekova K, Cico K, Tapajna M, Weber U, Baumann PK, Lindner J, Espinos JP Journal of the Electrochemical Society, 153(8), F176, 2006 |
| 9 |
Measurement of generation parameters on Ru/HfO2/Si MOS capacitor Tapajna M, Harmatha L, Husekova K Solid-State Electronics, 50(2), 177, 2006 |
| 10 |
Determining the generation lifetime in a MOS capacitor using linear sweep techniques Tapajna M, Harmatha L Solid-State Electronics, 48(12), 2339, 2004 |