화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Control of oxidation on NiSix during etching and ashing processes
Sakamori S, Yonekura K, Fujiwara N, Kosaka T, Ohkuni M, Tateiwa K
Thin Solid Films, 515(12), 4933, 2007
2 Suppression of 193-nm photoresist deformation by H-2 addition to fluorocarbon plasma in via-hole etching
Yonekura K, Yoshikawa K, Fujiwara Y, Sakamori S, Fujiwara N, Kosaka T, Ohkuni M, Tateiwa K
Thin Solid Films, 515(12), 5012, 2007
3 Socius, a novel binding partner of G alpha(12/13), promotes the G alpha(12)-induced RhoA activation
Tateiwa K, Katoh H, Negishi M
Biochemical and Biophysical Research Communications, 337(2), 615, 2005