검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Effect of process related and haze defects on 193 nm immersion lithography Tay CJ, Quan C, Ling ML, Lin Q, Chua GS Journal of Vacuum Science & Technology B, 28(1), 45, 2010 |
| 2 |
Forbidden pitch improvement using modified illumination in lithography Ling ML, Tay CJ, Quan C, Chua GS, Lin Q Journal of Vacuum Science & Technology B, 27(1), 85, 2009 |
| 3 |
Edge effects characterization of phase shift mask Chua GS, Tay CJ, Quan CH, Lin QY Journal of Vacuum Science & Technology B, 23(2), 417, 2005 |
| 4 |
Improvement of Rayleigh criterion with duty ratio characterization for subwavelength lithography Chua GS, Tay CJ, Quan CG, Lin QY Journal of Vacuum Science & Technology B, 22(2), 801, 2004 |
| 5 |
The influence of process parameters on forged magnesium alloys Chan CF, Yong MS, Tay CJ, Shang HM Materials Science Forum, 437-4, 427, 2003 |