화학공학소재연구정보센터
검색결과 : 14건
No. Article
1 A comparative study of the impact of Mo and stainless steel substrates on the properties of Cu(In,Ga)Se-2 based solar cells
Stanley M, Jubault M, Gaiaschi S, Tempez A, Donsanti F, Naghavi N
Thin Solid Films, 671, 6, 2019
2 Improved interface and electrical properties of atomic layer deposited Al2O3/4H-SiC
Suvanam SS, Usman M, Martin D, Yazdi MG, Linnarsson M, Tempez A, Gotelid M, Hallen A
Applied Surface Science, 433, 108, 2018
3 Ga-grading and Solar Cell Capacitance Simulation of an industrial Cu(In,Ga)Se-2 solar cell produced by an in-line vacuum, all-sputtering process
Bras P, Frisk C, Tempez A, Niem E, Platzer-Bjorkman C
Thin Solid Films, 636, 367, 2017
4 Passivation behaviour of 304 stainless steel in an ionic liquid with a fluorinated anion
Molchan IS, Thompson GE, Walton J, Skeldon P, Tempez A, Legendre S
Applied Surface Science, 357, 37, 2015
5 (PIMS)-I-2 depth profile analysis of high temperature boron oxynitride dielectric films
Badi N, Vijayaraghavan S, Benqaoula A, Tempez A, Tauziede C, Chapon P
Applied Surface Science, 292, 1, 2014
6 Regulatory T Cells Increase the Avidity of Primary CD8(+) T Cell Responses and Promote Memory
Pace L, Tempez A, Arnold-Schrauf C, Lemaitre F, Bousso P, Fetler L, Sparwasser T, Amigorena S
Science, 338(6106), 532, 2012
7 Quantitative depth profile analysis of boron implanted silicon by pulsed radiofrequency glow discharge time-of-flight mass spectrometry
Pisonero J, Lobo L, Bordel N, Tempez A, Bensaoula A, Badi N, Sanz-Medel A
Solar Energy Materials and Solar Cells, 94(8), 1352, 2010
8 GaN thin film growth on GaAs (001) by CBE and plasma-assisted MBE
Kim E, Rusakova I, Berishev I, Tempez A, Bensaoula A
Journal of Crystal Growth, 243(3-4), 456, 2002
9 Characterization of TiAlN thin film annealed under O-2 by in situ time of flight direct recoil spectroscopy/mass spectroscopy of recoiled ions and ex situ x-ray photoelectron spectroscopy
Tempez A, Bensaoula A, Schultz A
Journal of Vacuum Science & Technology A, 20(4), 1320, 2002
10 Selective area growth of GaN on Si(111) by chemical beam epitaxy
Kim E, Tempez A, Medelci N, Berishev I, Bensaoula A
Journal of Vacuum Science & Technology A, 18(4), 1130, 2000