검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Backbone Degradable Poly(aryl acetal) Photoresist Polymers: Synthesis, Acid Sensitivity, and Extreme Ultraviolet Lithography Performance Ober MS, Romer DR, Etienne J, Thomas PJ, Jain V, Cameron JF, Thackeray JW Macromolecules, 52(3), 886, 2019 |
| 2 |
Driving Force Dependence of Electron Transfer from Electronically Excited [Ir(COD)(mu-Me(2)pz)](2) to Photo-Acid Generators Sattler W, Rachford AA, LaBeaume PJ, Coley SM, Thackeray JW, Cameron JF, Muller AM, Winkler JR, Gray HB Journal of Physical Chemistry A, 121(40), 7572, 2017 |
| 3 |
Advanced Photoresist Technologies by Intricate Molecular Brush Architectures: Diblock Brush Terpolymer-Based Positive-Tone Photoresist Materials Sun GR, Cho SH, Yang F, He X, Pavia-Sanders A, Clark C, Raymond JE, Verkhoturov SV, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Journal of Polymer Science Part A: Polymer Chemistry, 53(2), 193, 2015 |
| 4 |
Directing Self-Assembly of Nanoscopic Cylindrical Diblock Brush Terpolymers into Films with Desired Spatial Orientations: Expansion of Chemical Composition Scope Cho SH, Yang F, Sun GR, Eller MJ, Clark C, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Macromolecular Rapid Communications, 35(4), 437, 2014 |
| 5 |
Nanoscopic Cylindrical Dual Concentric and Lengthwise Block Brush Terpolymers as Covalent Preassembled High-Resolution and High-Sensitivity Negative-Tone Photoresist Materials Sun GR, Cho SH, Clark C, Verkhoturov SV, Eller MJ, Li A, Pavia-Jimenez A, Schweikert EA, Thackeray JW, Trefonas P, Wooley KL Journal of the American Chemical Society, 135(11), 4203, 2013 |
| 6 |
Effect of Acid Diffusion on Performance in Positive Deep-Ultraviolet Resists Fedynyshyn TH, Thackeray JW, Georger JH, Denison MD Journal of Vacuum Science & Technology B, 12(6), 3888, 1994 |
| 7 |
Dissolution Rate Properties of 3-Component Deep-Ultraviolet Positive Photoresists Thackeray JW, Denison M, Fedynyshyn TH, Georger J, Mori JM, Orsula GW Journal of Vacuum Science & Technology B, 11(6), 2855, 1993 |