화학공학소재연구정보센터
검색결과 : 8건
No. Article
1 A feature scale model for chemical mechanical planarization of damascene structures
Saxena R, Thakurta DG, Gutmann RJ, Gill WN
Thin Solid Films, 449(1-2), 192, 2004
2 Surface kinetics model for SiLK chemical mechanical polishing
Borst CL, Thakurta DG, Gill WN, Gutmann RJ
Journal of the Electrochemical Society, 149(2), G118, 2002
3 Three-dimensional wafer-scale copper chemical-mechanical planarization model
Thakurta DG, Schwendeman DW, Gutmann RJ, Shankar S, Jiang L, Gill WN
Thin Solid Films, 414(1), 78, 2002
4 Three-dimensional chemical mechanical planarization slurry flow model based on lubrication theory
Thakurta DG, Borst CL, Schwendeman DW, Gutmann RJ, Gill WN
Journal of the Electrochemical Society, 148(4), G207, 2001
5 Pad porosity, compressibility and slurry delivery effects in chemical-mechanical planarization: modeling and experiments
Thakurta DG, Borst CL, Schwendeman DW, Gutmann RJ, Gill WN
Thin Solid Films, 366(1-2), 181, 2000
6 Two-dimensional wafer-scale chemical mechanical planarization models based on lubrication theory and mass transport
Sundararajan S, Thakurta DG, Schwendeman DW, Murarka SP, Gill WN
Journal of the Electrochemical Society, 146(2), 761, 1999
7 Chemical mechanical polishing mechanisms of low dielectric constant polymers in copper slurries
Borst CL, Thakurta DG, Gill WN, Gutmann RJ
Journal of the Electrochemical Society, 146(11), 4309, 1999
8 Thermophoretic deposition of small particles in a direct numerical simulation of turbulent channel flow
Thakurta DG, Chen M, McLaughlin JB, Kontomaris K
International Journal of Heat and Mass Transfer, 41(24), 4167, 1998