| 1 |
Spectroscopic ellipsometry and photoluminescence measurements of as-deposited and annealed silicon rich oxynitride films
Kohli S, Theil JA, McCurdy PR, Dippo PC, Ahrenkiel RK, Rithner CD, Dorhout PK
Thin Solid Films, 516(12), 4342, 2008 |
| 2 |
Chemical, optical, vibrational and luminescent properties of hydrogenated silicon-rich oxynitride films
Kohli S, Theil JA, Dippo PC, Ahrenkiel RK, Rithner CD, Dorhout PK
Thin Solid Films, 473(1), 89, 2005 |
| 3 |
Fabrication and characterization of silicon nanocrystals by thermal oxidation of a-Si : H films in air
Kohli S, Theil JA, Snyder RD, Rithner CD, Dorhout PK
Journal of Vacuum Science & Technology B, 21(2), 719, 2003 |
| 4 |
Fluorinated amorphous carbon films for low permittivity interlevel dielectrics
Theil JA
Journal of Vacuum Science & Technology B, 17(6), 2397, 1999 |
| 5 |
Vanadium Reactive Magnetron Sputtering in Mixed Ar/O-2 Discharges
Theil JA, Kusano E, Rockett A
Thin Solid Films, 298(1-2), 122, 1997 |
| 6 |
Gas-Distribution Through Injection Manifolds in Vacuum-Systems
Theil JA
Journal of Vacuum Science & Technology A, 13(2), 442, 1995 |
| 7 |
Deep Trench Fabrication by Si(110) Orientation-Dependent Etching
Theil JA
Journal of Vacuum Science & Technology B, 13(5), 2145, 1995 |
| 8 |
Carbon Content of Silicon-Oxide Films Deposited by Room-Temperature Plasma-Enhanced Chemical-Vapor-Deposition of Hexamethyldisiloxane and Oxygen
Theil JA, Brace JG, Knoll RW
Journal of Vacuum Science & Technology A, 12(4), 1365, 1994 |
