| 1 |
Influence of the Electrochemical Parameters on the Properties of Electroplated Au-Cu Alloys
Brun E, Durut F, Botrel R, Theobald M, Legaie O, Popa I, Vignal V
Journal of the Electrochemical Society, 158(4), D223, 2011 |
| 2 |
Atomic force microscopy investigation of a-C : H films prepared by plasma enhanced chemical vapor deposition for inertial confinement fusion experiments
Dumay B, Finot E, Theobald M, Legaie O, Baclet P, Durand J, Goudonnet JP
Journal of Vacuum Science & Technology A, 20(2), 366, 2002 |
| 3 |
Doped CHx microshells prepared by radio frequency plasma enhanced chemical vapor deposition for inertial confinement fusion experiments
Theobald M, Baclet P, Legaie O, Durand J
Journal of Vacuum Science & Technology A, 19(1), 118, 2001 |
| 4 |
Comparative study of a-C : H films for inertial confinement fusion prepared with various hydrocarbon precursors by radio frequency-plasma enhanced chemical vapor deposition
Theobald M, Durand J, Baclet P, Legaie O
Journal of Vacuum Science & Technology A, 18(1), 278, 2000 |
| 5 |
Control of performance and stability of thin film diodes using chromium nitride contacts
Mc Garvey B, Curran JE, Ford FA, Gale IG, Hewett J, Theobald M
Journal of Vacuum Science & Technology A, 16(4), 2678, 1998 |
