검색결과 : 8건
| No. | Article |
|---|---|
| 1 |
Development of phosphor containing functional coatings via cold atmospheric pressure plasma jet - Study of various operating parameters Pandiyaraj KN, Ramkumar MC, Kumar AA, Vasu D, Padmanabhan PVA, Tabaei PSE, Cools P, De Geyter N, Morent R, Jaganathan SK Applied Surface Science, 488, 343, 2019 |
| 2 |
Ultrafast production of silicon via aluminothermic reduction of tetrachlorosilane in a thermal plasma jet Shinoda K, Murakami H, Sawabe Y, Saegusa K Chemical Engineering Journal, 198, 61, 2012 |
| 3 |
Growth of Si crystalline in SiOx films induced by millisecond rapid thermal annealing using thermal plasma jet Okada T, Higashi S, Kaku H, Yorimoto T, Murakami H, Miyazaki S Solid-State Electronics, 52(3), 377, 2008 |
| 4 |
Effect of He addition on the heating characteristics of substrate surface irradiated by Ar thermal plasma jet Okada T, Higashi S, Kaku H, Koba N, Murakami H, Miyazaki S Thin Solid Films, 516(11), 3680, 2008 |
| 5 |
Application to cleaning of waste plastic surfaces using atmospheric non-thermal plasma jets Araya M, Yuji T, Watanabe T, Kashihara J, Sumida Y Thin Solid Films, 515(9), 4301, 2007 |
| 6 |
Control of substrate surface temperature in millisecond annealing technique using thermal plasma jet Okada T, Higashi S, Kaku H, Koba N, Murakami H, Miyazaki S Thin Solid Films, 515(12), 4897, 2007 |
| 7 |
A new crystallization technique of Si films on glass substrate using thermal plasma jet Kaku H, Higashi S, Taniguchi H, Murakami H, Miyazaki S Applied Surface Science, 244(1-4), 8, 2005 |
| 8 |
Crystallization of Si films on glass substrate using thermal plasma jet Higashi S, Kaku H, Taniguchi H, Murakami H, Miyazaki S Thin Solid Films, 487(1-2), 122, 2005 |