화학공학소재연구정보센터
검색결과 : 12건
No. Article
1 Low temperature Si:C co-flow and hybrid process using Si3H8/Cl-2
Bauer M, Thomas SG
Thin Solid Films, 520(8), 3133, 2012
2 Low temperature catalyst enhanced etch process with high etch rate selectivity for amorphous silicon based alloys over single-crystalline silicon based alloys
Bauer M, Thomas SG
Thin Solid Films, 520(8), 3139, 2012
3 Low temperature selective epitaxial growth of SiCP on Si(110) oriented surfaces
Bauer M, Thomas SG
Thin Solid Films, 520(8), 3144, 2012
4 Characterization and analysis of epitaxial silicon phosphorus alloys for use in n-channel transistors
Weeks KD, Thomas SG, Dholabhai P, Adams J
Thin Solid Films, 520(8), 3158, 2012
5 Novel chemical precursors and novel CVD strategies enabling low temperature epitaxy of Si and Si:C alloys
Bauer M, Thomas SG
Thin Solid Films, 518, S200, 2010
6 Enabling Moore's Law beyond CMOS technologies through heteroepitaxy
Thomas SG, Tomasini P, Bauer M, Vyne B, Zhang Y, Givens M, Devrajan J, Koester S, Lauer I
Thin Solid Films, 518, S53, 2010
7 Analysis of silicon germanium vapor phase epitaxy kinetics
Tomasini P, Machkaoutsan V, Thomas SG
Thin Solid Films, 518, S12, 2010
8 Stability of silicon germanium stressors
Tomasini P, Machkaoutsan V, Thomas SG, Loo R, Caymax M, Verheyen P
Thin Solid Films, 518, S133, 2010
9 Hydrogen termination for extended queue times for low temperature epitaxy
Brabant P, Ferrara J, Pagliaro B, Weeks K, Rittgers M, Scott R, Zhang Y, Landin T, Irving T, Spear J, Italiano J, Thomas SG
Applied Surface Science, 255(5), 1741, 2008
10 The effect of plastic strain relaxation on the morphology of Ge quantum dot superlattices
Liu JL, Wang KL, Xie QH, Thomas SG
Journal of Crystal Growth, 274(3-4), 367, 2005