화학공학소재연구정보센터
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No. Article
1 Dynamic mode optimization for the deposition of homogeneous TiO2 thin film by atmospheric pressure PECVD using a microwave plasma torch
Perraudeau A, Dublanche-Tixier C, Tristant P, Chazelas C
Applied Surface Science, 493, 703, 2019
2 Multi-structural TiO2 film synthesised by an atmospheric pressure plasma-enhanced chemical vapour deposition microwave torch
Gazal Y, Dublanche-Tixier C, Chazelas C, Colas M, Carles P, Tristant P
Thin Solid Films, 600, 43, 2016
3 Elaboration of nanostructured TiO2/SiO2 films by plasma enhanced chemical vapor deposition at atmospheric pressure
Gazal Y, Dublanche-Tixier C, Antoine A, Colas M, Chazelas C, Tristant P
Thin Solid Films, 619, 137, 2016
4 Elastic modulus of TiHfCN thin films by instrumented indentation
Chicot D, Puchi-Cabrera ES, Aumaitre R, Bouscarrat G, Dublanche-Tixier C, Roudet F, Staia MH
Thin Solid Films, 522, 304, 2012
5 Microstructure and mechanical properties of AlN films obtained by plasma enhanced chemical vapor deposition
Sanchez G, Abdallah B, Tristant P, Dublanche-Tixier C, Djouadi MA, Besland MP, Jouan PY, Alles AB
Journal of Materials Science, 44(22), 6125, 2009
6 Raman analysis of DLC coated engine components with complex shape: Understanding wear mechanisms
Jaoul C, Jarry O, Tristant P, Merle-Mejean T, Colas M, Dublanche-Tixier C, Jacquet JM
Thin Solid Films, 518(5), 1475, 2009
7 Properties of aluminum oxide thin films deposited by pulsed laser deposition and plasma enhanced chemical vapor deposition
Cibert C, Hidalgo H, Champeaux C, Tristant P, Tixier C, Desmaison J, Catherinot A
Thin Solid Films, 516(6), 1290, 2008
8 Polycrystalline AlN films with preferential orientation by plasma enhanced chemical vapor deposition
Sanchez G, Wu A, Tristant P, Tixier C, Soulestin B, Desmaison J, Alles AB
Thin Solid Films, 516(15), 4868, 2008
9 Physico-chemistry and morphology of silicon surface during the first stage of alumina deposition
Jonnard P, Desmaison J, Hidalgo H, Rossignol F, Tixier C, Tristant P
Applied Surface Science, 212, 674, 2003
10 Study of the Adhesion Between A-CH Films and Ta6V Substrates by Electron-Induced X-Ray-Emission Spectroscopy (Exes)
Jonnard P, Tixier C, Desmaison J, Hombourger C, Bonnelle C
Thin Solid Films, 306(1), 119, 1997