검색결과 : 1건
No. | Article |
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1 |
Thermal stability and electrical characterization of HfO2 films on thermally nitrided Si Bastos KP, Morais J, Miotti L, Soares GV, Pezzi RP, da Silva RCG, Boudinov H, Baumvol IJR, Hegde RI, Tseng HH, Tobinc PJ Journal of the Electrochemical Society, 151(6), F153, 2004 |