| 1 |
Reverse osmosis performance and chlorine resistance of new ternary aromatic copolyamides comprising 3,3 '-diaminodiphenylsulfone and a comonomer with a carboxyl group
Konagaya S, Tokai M, Kuzumoto H
Journal of Applied Polymer Science, 80(4), 505, 2001 |
| 2 |
Synthesis of ternary copolyamides from aromatic diamine (m-phenylenediamine, diaminodiphenylsulfone), aromatic diamine with carboxyl or sulfonic group (3,5-diaminobenzoic acid, 2,4-diaminobenzenesulfonic acid), and iso- or terephthaloyl chloride
Konagaya S, Tokai M
Journal of Applied Polymer Science, 76(6), 913, 2000 |
| 3 |
Growth of microcrystalline silicon film by electron beam excited plasma chemical vapor deposition without hydrogen dilution
Imaizumi M, Okitsu K, Yamaguchi M, Hara T, Ito T, Konomi I, Ban M, Tokai M, Kawamura K
Journal of Vacuum Science & Technology A, 16(5), 3134, 1998 |
| 4 |
Physical Gelation Process for Cellulose Whose Hydroxyl-Groups Are Regioselectively Substituted by Fluorescent Groups
Itagaki H, Tokai M, Kondo T
Polymer, 38(16), 4201, 1997 |
