화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Prevention of Cu degradation using in situ N-2 plasma treatment in a dual-damascene process
Tomohisa S, Yoshikawa K, Yonekura K, Sakamori S, Fujiwara N, Tsujimoto K, Nishioka K, Kobayashi H, Oomori T
Journal of Vacuum Science & Technology B, 23(5), 2084, 2005
2 Transport mechanisms of ions and neutrals in low-pressure, high-density plasma etching of high aspect ratio contact holes
Nishikawa K, Ootera H, Tomohisa S, Oomori T
Thin Solid Films, 374(2), 190, 2000