검색결과 : 7건
| No. | Article |
|---|---|
| 1 |
Modeling of edge roughness in ion projection lithography Henke W, Torkler M Journal of Vacuum Science & Technology B, 17(6), 3112, 1999 |
| 2 |
Minimum ion-beam exposure-dose determination for chemically amplified resist from printed dot matrices Bruenger WH, Torkler M, Weiss M, Loschner H, Leung K, Lee Y, Hudek P, Rangelow IW, Stangl G, Fallmann W Journal of Vacuum Science & Technology B, 17(6), 3119, 1999 |
| 3 |
Measuring acid generation efficiency in chemically amplified resists with all three beams Szmanda CR, Brainard RL, Mackevich JF, Awaji A, Tanaka T, Yamada Y, Bohland J, Tedesco S, Dal'Zotto B, Bruenger W, Torkler M, Fallmann W, Loeschner H, Kaesmaier R, Nealey PM, Pawloski AR Journal of Vacuum Science & Technology B, 17(6), 3356, 1999 |
| 4 |
Chemically amplified deep ultraviolet resist for positive tone ion exposure Bruenger WH, Torkler M, Buchmann LM, Finkelstein W Journal of Vacuum Science & Technology B, 15(6), 2355, 1997 |
| 5 |
Hpr-506 Photoresist Used as a Positive Tone Ion Resist Bruenger WH, Buchmann LM, Torkler M, Sinkwitz S Journal of Vacuum Science & Technology B, 14(6), 3924, 1996 |
| 6 |
Experimental Investigation of Stochastic Space-Charge Effects on Pattern Resolution in Ion Projection Lithography Systems Hammel E, Chalupka A, Fegerl J, Fischer R, Lammer G, Loschner H, Malek L, Nowak R, Stengl G, Vonach H, Wolf P, Brunger WH, Buchmann LM, Torkler M, Cekan E, Fallmann W, Paschke F, Stangl G, Thalinger F, Berry IL, Harriott LR, Finkelstein W, Hill RW Journal of Vacuum Science & Technology B, 12(6), 3533, 1994 |
| 7 |
Edge Roughness of a 200-nm Pitch Resist Pattern Fabricated by Ion Projection Lithography Brunger WH, Blaschke J, Torkler M, Buchmann LM Journal of Vacuum Science & Technology B, 11(6), 2404, 1993 |