화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Understanding the growth of p-doped 4H-SiC layers using vapour-liquid-solid transport
Vo-Ha A, Carole D, Lazar M, Tournier D, Cauwet F, Souliere V, Thierry-Jebali N, Brosselard P, Planson D, Brylinski C, Ferro G
Thin Solid Films, 548, 125, 2013
2 4H-SiC MOS structures fabricated from RTCVD Si layers oxidized in diluted N2O
Perez-Tomas A, Tournier D, Godignon P, Mestres N, Millan J
Materials Science Forum, 483, 673, 2005
3 Temperature impact on high-current 1.2kV SiC Schottky rectifiers
Jorda X, Tournier D, Rebollo J, Millan J, Godignon P
Materials Science Forum, 483, 929, 2005
4 Temperature Dependence of 4H-SiC JBS and Schottky Diodes after High Temperature Treatment of Contact Metal
Perez R, Mestres N, Tournier D, Jorda X, Vellvehi M, Godignon P
Materials Science Forum, 483, 945, 2005
5 Electrical characterization of deposited and oxidized Ta2Si as dielectric film for SiC metal-insulator-semiconductor structures.
Perez A, Tournier D, Montserrat J, Mestres N, Sandiumenge F, Millan J
Materials Science Forum, 457-460, 845, 2004
6 SiC-based current limiter devices
Chante JP, Tournier D, Planson D, Raynaud C, Lazar M, Locatelli ML, Brosselard P
Materials Science Forum, 457-460, 951, 2004
7 On-chip temperature monitoring of a SiC current limiter
Tournier D, Godignon P, Millan J, Planson D, Chante JP, Sarrus F, de Palma JF
Materials Science Forum, 457-460, 1021, 2004
8 A highly effective edge termination design for SiC planar high power devices
Perez R, Mestres N, Blanque S, Tournier D, Jorda X, Godignon P, Nipoti R
Materials Science Forum, 457-460, 1253, 2004
9 Simulation study of a novel current-limiting device: A vertical alpha-SiC JFET - Controlled current limiter
Tournier D, Godignon P, Planson D, Chante JP, Sarrus F
Materials Science Forum, 389-3, 1243, 2002
10 Compatibility of VJFET technology with MESFET fabrication and its interest for system integration: Fabrication of 6H and 4H-SiC 110 V lateral MESFET
Tournier D, Godignon P, Montserrat J, Planson D, Chante JP, Sarrus F
Materials Science Forum, 389-3, 1403, 2002