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| No. | Article |
|---|---|
| 1 |
Interferometry for end point prediction during plasma etching of various structures in complementary metal-oxide-semiconductor device fabrication Layadi N, Molloy SJ, Esry TC, Lill T, Trevor J, Grimbergen MN, Chinn J Journal of Vacuum Science & Technology B, 17(6), 2630, 1999 |