검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Linewidth reduction using liquid ashing for sub-100 nm critical dimensions with 248 nm lithography Timko AG, Frackoviak J, Hopkins LC, Klemens FP, Trimble LE, Nalamasu O, Watson GP, Mansfield WM, Barr D, Li J Journal of Vacuum Science & Technology B, 19(6), 2713, 2001 |
| 2 |
Focus drilling and attenuated phase shift mask for subwavelength contact window printing using positive and negative resists Pau S, Trimble LE, Blatchford JW, Watson GP, Frackoviak J, Cirelli R, Nalamasu O Journal of Vacuum Science & Technology B, 17(6), 2499, 1999 |
| 3 |
Patterning of X-Ray Masks Using the Negative-Acting Resist P(Si-CMS) Mixon DA, Novembre AE, Tai WW, Jurgensen CW, Frackoviak J, Trimble LE, Kola RR, Celler GK Journal of Vacuum Science & Technology B, 11(6), 2834, 1993 |
| 4 |
Study of Electron-Beam Patterning of Resist on Tungsten X-Ray Masks Cummings KD, Resnick DJ, Frackoviak J, Kola RR, Trimble LE, Grant B, Silverman S, Haas L, Jennings B Journal of Vacuum Science & Technology B, 11(6), 2872, 1993 |