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| No. | Article |
|---|---|
| 1 |
Low-Temperature Deposition of High-Quality Silicon Dioxide Films by Sputtering-Type Electron-Cyclotron-Resonance Plasma Nakashima H, Furukawa K, Liu YC, Gao DW, Kashiwazaki Y, Muraoka K, Shibata K, Tsurushima T Journal of Vacuum Science & Technology A, 15(4), 1951, 1997 |