화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Reduction of grown-in defects by high temperature annealing
Adachi N, Hisatomi T, Sano M, Tsuya H
Journal of the Electrochemical Society, 147(1), 350, 2000
2 Effect of heavy boron doping on oxide precipitate growth in Czochralski silicon
Ono T, Asayama E, Horie H, Hourai M, Sueoka K, Tsuya H, Rozgonyi GA
Journal of the Electrochemical Society, 146(6), 2239, 1999
3 Oxide precipitate-induced dislocation generation in heavily boron-doped Czochralski silicon
Ono T, Romanowski A, Asayama E, Horie H, Sueoka K, Tsuya H, Rozgonyi GA
Journal of the Electrochemical Society, 146(9), 3461, 1999
4 Gettering of Cu and Ni Impurities in Simox Wafers
Jablonski J, Miyamura Y, Imai M, Tsuya H
Journal of the Electrochemical Society, 142(6), 2059, 1995