검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Influence of base additives on the reaction-diffusion front of model chemically amplified photoresists Vogt BD, Kang SH, Prabhu VM, Rao A, Lin EK, Wu WL, Satija SK, Turnquest K Journal of Vacuum Science & Technology B, 25(1), 175, 2007 |
| 2 |
Characterization of compositional heterogeneity in chemically amplified photoresist polymer thin films with infrared spectroscopy Kang S, Vogt BD, Wu WL, Prabhu VM, VanderHart DL, Rao A, Lin EK, Turnquest K Macromolecules, 40(5), 1497, 2007 |
| 3 |
Measurements of the reaction-diffusion front of model chemically amplified photoresists with varying photoacid size Vogt BD, Kang S, Prabhu VM, Lin EK, Satija SK, Turnquest K, Wu WL Macromolecules, 39(24), 8311, 2006 |
| 4 |
Effect of copolymer composition on acid-catalyzed deprotection reaction kinetics in model photoresists Kang SHH, Prabhu VM, Vogt BD, Lin EK, Wu WL, Turnquest K Polymer, 47(18), 6293, 2006 |