화학공학소재연구정보센터
검색결과 : 4건
No. Article
1 Atomic layer deposition of hafnium oxide using anhydrous hafnium nitrate
Conley JF, Ono Y, Zhuang W, Tweet DJ, Gao W, Mohammed SK, Solanki R
Electrochemical and Solid State Letters, 5(5), C57, 2002
2 Effect of interlayer on thermal stability of nickel silicide
Maa JS, Ono Y, Tweet DJ, Zhang FY, Hsu ST
Journal of Vacuum Science & Technology A, 19(4), 1595, 2001
3 Selectivity to silicon nitride in chemical vapor deposition of titanium silicide
Maa JS, Howard DJ, He SS, Tweet DJ, Stecker L, Stecker G, Hsu ST
Journal of Vacuum Science & Technology B, 17(5), 2243, 1999
4 Electrical properties of AlN thin films deposited at low temperature on Si(100)
Aardahl CL, Rogers JW, Yun HK, Ono Y, Tweet DJ, Hsu ST
Thin Solid Films, 346(1-2), 174, 1999