검색결과 : 3건
| No. | Article |
|---|---|
| 1 |
Agent-Based model to predict the fate of the degradation of organic compounds in the aqueous-phase UV/H2O2 advanced oxidation process Zupko R, Kamath D, Coscarelli E, Rouleau M, Minakata D Process Safety and Environmental Protection, 136, 49, 2020 |
| 2 |
Photolysis and UV/H2O2 of diclofenac, sulfamethoxazole, carbamazepine, and trimethoprim: Identification of their major degradation products by ESI-LC-MS and assessment of the toxicity of reaction mixtures Alharbi SK, Kang JG, Nghiem LD, van de Merwe JP, Leusch FDL, Price WE Process Safety and Environmental Protection, 112, 222, 2017 |
| 3 |
Photooxidative removal of Hg0 from simulated flue gas using UV/H2O2 advanced oxidation process: Influence of operational parameters Zhang B, Zhong Z, Ding K, Yu L Korean Journal of Chemical Engineering, 31(1), 56, 2014 |