| 1 |
Observation of anisotropic microstructural changes during cycling in LiNi0.5Co0.2Mn0.3O2 cathode material
Kuriyama H, Saruwatari H, Satake H, Shima A, Uesugi F, Tanaka H, Ushirogouchi T
Journal of Power Sources, 275, 99, 2015 |
| 2 |
Capture of flaked particles during plasma etching by a negatively biased electrode
Moriya T, Ito N, Uesugi F
Journal of Vacuum Science & Technology B, 22(5), 2359, 2004 |
| 3 |
The application of in situ monitor of extremely rarefied particle clouds grown thermally above wafers by using laser light scattering method to the development of the mass-production condition of the tungsten thermal chemical vapor deposition
Ito N, Moriya T, Uesugi F, Moriya S, Aomori M, Kato Y
Journal of Vacuum Science & Technology A, 19(4), 1248, 2001 |
| 4 |
Generation of positively charged particles at an anode and transport to device wafers in a real radio frequency plasma etching chamber for tungsten etch-back process
Moriya T, Ito N, Uesugi F, Hayashi Y, Okamura K
Journal of Vacuum Science & Technology A, 18(4), 1282, 2000 |
| 5 |
Real-time monitoring of scattered laser light by a single particle of several tens of nanometers in the etching chamber in relation to its status with the equipment
Uesugi F, Ito N, Moriya T, Doi H, Sakamoto S, Hayashi Y
Journal of Vacuum Science & Technology A, 16(3), 1189, 1998 |
| 6 |
Observation of the trajectories of particles in process equipment by an in situ monitoring system using a laser light scattering method
Ito N, Moriya T, Uesugi F, Doi H, Sakamoto S, Hayashi Y
Journal of Vacuum Science & Technology B, 16(6), 3339, 1998 |
