화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Absolute calibration of TALIEF of atomic nitrogen by NO titration -Experimental and theoretical analysis
Repsilber T, Uhlenbusch J
Plasma Chemistry and Plasma Processing, 24(3), 373, 2004
2 Studies on gas purification by a pulsed microwave discharge at 2.46 GHz in mixtures of N-2/NO/O-2 at atmospheric pressure (vol 21, pg 225, 2001)
Baeva M, Gier H, Pott A, Uhlenbusch J, Hoschele J, Steinwandel J
Plasma Chemistry and Plasma Processing, 22(1), 197, 2002
3 Diagnostics of an RF plasma flash evaporation process using the monochromatic imaging technique
Buchner P, Schubert H, Uhlenbusch J, Weiss M
Plasma Chemistry and Plasma Processing, 21(1), 1, 2001
4 Studies on gas purification by a pulsed microwave discharge at 2.46 GHz in mixtures of N-2/NO/O-2 at atmospheric pressure
Baeva M, Gier H, Pott A, Uhlenbusch J, Hoschele J, Steinwandel J
Plasma Chemistry and Plasma Processing, 21(2), 225, 2001
5 Production and characterization of nanosized Cu/O/SiC composite particles in a thermlal r.f. plasma reactor
Buchner P, Lutzenkirchen-Hecht D, Strehblow HH, Uhlenbusch J
Journal of Materials Science, 34(5), 925, 1999
6 Coherent anti-Stokes Raman scattering applied to hydrocarbons in a microwave excited process plasma
Hadrich S, Pfelzer B, Uhlenbusch J
Plasma Chemistry and Plasma Processing, 19(1), 91, 1999
7 Modeling and spectroscopic investigations on the evaporation of zirconia in a thermal rf plasma
Buchner P, Schubert H, Uhlenbusch J, Willee K
Plasma Chemistry and Plasma Processing, 19(3), 341, 1999
8 CARS diagnostic and modeling of a dielectric barrier discharge
Baeva M, Dogan A, Ehlbeck J, Pott A, Uhlenbusch J
Plasma Chemistry and Plasma Processing, 19(4), 445, 1999
9 Experimental and theoretical studies of a pulsed microwave excited Ar/CF4 plasma
Baeva M, Luo X, Schafer JH, Uhlenbusch J, Zhang Z
Plasma Chemistry and Plasma Processing, 18(4), 429, 1998