검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Comparison of reference-free X-ray fluorescence analysis and X-ray reflectometry for thickness determination in the nanometer range Kolbe M, Beckhoff B, Krumrey M, Ulm G Applied Surface Science, 252(1), 49, 2005 |
| 2 |
Characterization of extreme ultraviolet masks by extreme ultraviolet scatterometry Perlich J, Kamm FM, Rau J, Scholze F, Ulm G Journal of Vacuum Science & Technology B, 22(6), 3059, 2004 |
| 3 |
Thickness determination for SiO2 films on Si by X-ray reflectometry at the SiK edge Krumrey A, Hoffmann M, Ulm G, Hasche K, Thomsen-Schmidt P Thin Solid Films, 459(1-2), 241, 2004 |
| 4 |
Effect of substrate roughness on Mo/Si multilayer optics for EUVL produced by UHV-e-beam evaporation and ion polishing Kleineberg U, Westerwalbesloh T, Hachmann W, Heinzmann U, Tummler J, Scholze F, Ulm G, Mullender S Thin Solid Films, 433(1-2), 230, 2003 |
| 5 |
Peak and Integrated reflectivity, wavelength and gamma optimization of Mo/Si, and Mo/Be multilayer, multielement optics for extreme ultraviolet lithography Stuik R, Louis E, Yakshin AE, Gorts PC, Maas ELG, Bijkerk F, Schmitz D, Scholze F, Ulm G, Haidl M Journal of Vacuum Science & Technology B, 17(6), 2998, 1999 |
| 6 |
The ubiquitin pathway in Parkinson's disease Leroy E, Boyer R, Auburger G, Leube B, Ulm G, Mezey E, Harta G, Brownstein MJ, Jonnalagada S, Chernova T, Dehejia A, Lavedan C, Gasser T, Steinbach PJ, Wilkinson KD, Polymeropoulos MH Nature, 395(6701), 451, 1998 |