화학공학소재연구정보센터
검색결과 : 2건
No. Article
1 Characterization of an ultrashallow junction structure using angle resolved x-ray photoelectron spectroscopy and medium energy ion scattering
Saheli G, Conti G, Uritsky Y, Foad MA, Brundle CR, Mack P, Kouzminov D, Werner M, van den Berg JA
Journal of Vacuum Science & Technology B, 26(1), 298, 2008
2 Root Cause Determination of Particle Contamination in the Tungsten Etch Back Process
Uritsky Y, Chen L, Zhang S, Wilson S, Mak A, Brundle CR
Journal of Vacuum Science & Technology A, 15(3), 1319, 1997