| 1 |
Atomic-scale characterization of plasma-induced damage in plasma-enhanced atomic layer deposition
Kim K, Oh IK, Kim H, Lee Z
Applied Surface Science, 425, 781, 2017 |
| 2 |
Improving discharge uniformity of industrial-scale very high frequency plasma sources by launching a traveling wave
Chen HL, Tu YC, Hsieh CC, Lin DL, Chang CJ, Leou KC
Current Applied Physics, 16(7), 700, 2016 |
| 3 |
High efficiency high rate microcrystalline silicon thin-film solar cells deposited at plasma excitation frequencies larger than 100 MHz
Strobel C, Leszczynska B, Merkel U, Kuske J, Fischer DD, Albert M, Holovsky J, Michard S, Bartha JW
Solar Energy Materials and Solar Cells, 143, 347, 2015 |
| 4 |
Control of micro void fraction and optical band gap in intrinsic amorphous silicon thin films (VHF-PECVD) for thin film solar cell application
Shin C, Park J, Jung J, Bong S, Kim S, Lee YJ, Yi J
Materials Research Bulletin, 60, 895, 2014 |
| 5 |
Optimization of intrinsic hydrogenated amorphous silicon deposited by very high-frequency plasma-enhanced chemical vapor deposition using the relationship between Urbach energy and silane depletion fraction for solar cell application
Shin C, Iftiquar SM, Park J, Kim Y, Baek S, Jang J, Kim M, Jung J, Lee Y, Kim S, Yi J
Thin Solid Films, 547, 256, 2013 |
| 6 |
Correlation of texture of Ag/ZnO back reflector and photocurrent in hydrogenated nanocrystalline silicon solar cells
Yan BJ, Yue GZ, Sivec L, Owens-Mawson J, Yang J, Guha S
Solar Energy Materials and Solar Cells, 104, 13, 2012 |
| 7 |
Preparation of Al-doped hydrogenated nanocrystalline cubic silicon carbide by VHF-PECVD for heterojunction emitter of n-type crystalline silicon solar cells
Hamashita D, Miyajima S, Konagai M
Solar Energy Materials and Solar Cells, 107, 46, 2012 |
| 8 |
Low defect interface study of intrinsic layer for c-Si surface passivation in a-Si:H/c-Si heterojunction solar cells
Kim S, Dao VA, Shin C, Cho J, Lee Y, Balaji N, Ahn S, Kim Y, Yi J
Thin Solid Films, 521, 45, 2012 |
| 9 |
Effect of the very high frequency plasma with a balanced power feeding on silicon film deposition
Muta H, Mizuno K, Nishida S, Kuribayashi S
Thin Solid Films, 523, 41, 2012 |
| 10 |
Synthesis and analysis of silicon nanowire below Si-Au eutectic temperatures using very high frequency plasma enhanced chemical vapor deposition
Hamidinezhad H, Wahab Y, Othaman Z, Ismail A
Applied Surface Science, 257(21), 9188, 2011 |
