검색결과 : 4건
| No. | Article |
|---|---|
| 1 |
Comparison of TiSi2, CoSi2, and NiSi for Thin-Film Silicon-on-Insulator Applications Chen J, Colinge JP, Flandre D, Gillon R, Raskin JP, Vanhoenacker D Journal of the Electrochemical Society, 144(7), 2437, 1997 |
| 2 |
High-Rate and Highly Selective Anisotropic Etching for WSix/Poly-Si Using Electron-Cyclotron-Resonance Plasma Nojiri K, Tsunokuni K, Yamazaki K Journal of Vacuum Science & Technology B, 14(3), 1791, 1996 |
| 3 |
Silicide Formation in the Co-Si System by Rapid Thermal Annealing Pelleg J, Zalkind S, Zevin L, Ditchek BM Thin Solid Films, 249(1), 126, 1994 |
| 4 |
Formation of Low-Pressure Chemically Vapor-Deposited W-Thin-Film on Silicon Dioxide for Gate Electrode Application Sone JH, Kim SO, Kim KJ, Kim HS, Kim HJ Thin Solid Films, 253(1-2), 377, 1994 |