화학공학소재연구정보센터
검색결과 : 9건
No. Article
1 Thin-film monocrystalline-silicon solar cells made by a seed layer approach on glass-ceramic substrates
Gordon I, Vallon S, Mayolet A, Beaucarne G, Poortmans J
Solar Energy Materials and Solar Cells, 94(2), 381, 2010
2 X-Ray Photoelectron-Spectroscopy Analyses of Oxide-Masked Polycrystalline SiGe Features Etched in a High-Density Plasma Source
Monget C, Vallon S, Bell FH, Vallier L, Joubert O
Journal of the Electrochemical Society, 144(7), 2455, 1997
3 Real-Time Ultraviolet Ellipsometry Monitoring of Gate Patterning in a High-Density Plasma
Vallon S, Joubert O, Vallier L, Ferrieu F, Drevillon B, Blayo N
Journal of Vacuum Science & Technology A, 15(3), 865, 1997
4 Polysilicon-Germanium Gate Patterning Studies in a High-Density Plasma Helicon Source
Vallon S, Monget C, Joubert O, Vallier L, Bell FH, Pons M, Regolini JL, Morin C, Sagnes I
Journal of Vacuum Science & Technology A, 15(4), 1874, 1997
5 Adhesion mechanisms of silica layers on plasma-treated polymers .1. Polycarbonate
Vallon S, Hofrichter A, Guyot L, Drevillon B, KlembergSapieha JE, Martinu L, PoncinEpaillard F
Journal of Adhesion Science and Technology, 10(12), 1287, 1996
6 Adhesion mechanisms of silica layers on plasma-treated polymers .2. Polypropylene
Vallon S, Brenot R, Hofrichter A, Drevillon B, Gheorghiu A, Senemaud C, KlembergSapieha JE, Martinu L, PoncinEpaillard F
Journal of Adhesion Science and Technology, 10(12), 1313, 1996
7 Argon Plasma Treatment of Polycarbonate - In-Situ Spectroellipsometry Study and Polymer Characterizations
Vallon S, Drevillon B, Poncinepaillard F, Klembergsapieha JE, Martinu L
Journal of Vacuum Science & Technology A, 14(6), 3194, 1996
8 Improvement of the Adhesion of Silica Layers to Polypropylene Induced by Nitrogen Plasma Treatment
Vallon S, Hofrichter A, Drevillon B, Klembergsapieha JE, Martinu L, Poncinepaillard F
Thin Solid Films, 290-291, 68, 1996
9 Investigation of the Adhesion Mechanisms of Silicon Alloy Thin-Films on Polymer Substrates by Ir Ellipsometry
Drevillon B, Rostaing JC, Vallon S
Thin Solid Films, 236(1-2), 204, 1993