검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Effect of resist surface characteristics on film-pulling velocity in immersion lithography Schuetter S, Shedd T, Nellis G, Romano A, Dammel R, Padmanaban M, Houlihan F, Krawicz A, Lin G, Rahman D, Chakrapani S, Neisser M, Van Peski C Journal of Vacuum Science & Technology B, 24(6), 2798, 2006 |
| 2 |
Full wafer simulation of immersion fluid heating El-Morsi M, Nellis G, Schuetter S, Van Peski C, Grenville A Journal of Vacuum Science & Technology B, 23(6), 2596, 2005 |
| 3 |
Static and dynamic contact angles of water on photoresist Burnett H, Shedd T, Nellis G, Van Peski C Journal of Vacuum Science & Technology B, 23(6), 2721, 2005 |
| 4 |
157 nm: Deepest deep-ultraviolet yet Rothschild M, Bloomstein TM, Curtin JE, Downs DK, Fedynyshyn TH, Hardy DE, Kunz RR, Liberman V, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C Journal of Vacuum Science & Technology B, 17(6), 3262, 1999 |
| 5 |
Materials issues for optical components and photomasks in 157 nm lithography Liberman V, Bloomstein TM, Rothschild M, Sedlacek JHC, Uttaro RS, Bates AK, Van Peski C, Orvek K Journal of Vacuum Science & Technology B, 17(6), 3273, 1999 |