검색결과 : 6건
| No. | Article |
|---|---|
| 1 |
Characterization and Correction of Optical Proximity Effects in Deep-Ultraviolet Lithography Using Behavior Modeling Yen A, Tritchkov A, Stirniman JP, Vandenberghe G, Jonckheere R, Ronse K, Vandenhove L Journal of Vacuum Science & Technology B, 14(6), 4175, 1996 |
| 2 |
Use of Positive and Negative Chemically Amplified Resists in Electron-Beam Direct-Write Lithography Tritchkov A, Jonckheere R, Vandenhove L Journal of Vacuum Science & Technology B, 13(6), 2986, 1995 |
| 3 |
Fundamental Principles of Phase-Shifting Masks by Fourier Optics - Theory and Experimental-Verification Ronse K, Debeeck MO, Vandenhove L Journal of Vacuum Science & Technology B, 12(2), 589, 1994 |
| 4 |
The Adequat Project for Development and Transfer of 0.25 Mu-M Logic Complementary Metal-Oxide-Semiconductor Modules Dekeersmaecker R, Declerck G, Felix P, Haond M, Hill C, Janssen G, Lorenz J, Maes H, Montree A, Neppl F, Patruno P, Rudan M, Ryssel H, Vandenhove L, Vandervorst W, Vanommen A Journal of Vacuum Science & Technology B, 12(4), 2852, 1994 |
| 5 |
Molybdenum Silicide Based Attenuated Phase-Shift Masks Jonckheere R, Ronse K, Popa O, Vandenhove L Journal of Vacuum Science & Technology B, 12(6), 3765, 1994 |
| 6 |
Extending the Limits of Optical Lithography for Arbitrary Mask Layouts Using Attenuated Phase-Shifting Masks with Optimized Illumination Ronse K, Pforr R, Baik KH, Jonckheere R, Vandenhove L Journal of Vacuum Science & Technology B, 12(6), 3783, 1994 |