화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 0.25 mu m fully depleted SOI MOSFETs for RF mixed analog-digital circuits, including a comparison with partially depleted devices with relation to high frequency noise parameters
Vanmackelberg M, Raynaud C, Faynot O, Pelloie JL, Tabone C, Grouillet A, Martin F, Dambrine G, Picheta L, Mackowiak E, Llinares P, Sevenhans J, Compagne E, Fletcher G, Flandre D, Dessard V, Vanhoenacker D, Raskin JP
Solid-State Electronics, 46(3), 379, 2002
2 Fully depleted SOICMOS technology for heterogeneous micropower, high-temperature or RF microsystems
Flandre D, Adriaensen S, Akheyar A, Crahay A, Demeus L, Delatte P, Dessard V, Iniguez B, Neve A, Katschmarskyj B, Loumaye P, Laconte J, Martinez I, Picun G, Rauly E, Renaux C, Spote D, Zitout M, Dehan M, Parvais B, Simon P, Vanhoenacker D, Raskin JP
Solid-State Electronics, 45(4), 541, 2001
3 Comparison of TiSi2, CoSi2, and NiSi for Thin-Film Silicon-on-Insulator Applications
Chen J, Colinge JP, Flandre D, Gillon R, Raskin JP, Vanhoenacker D
Journal of the Electrochemical Society, 144(7), 2437, 1997