검색결과 : 11건
| No. | Article |
|---|---|
| 1 |
Fabrication of diffractive optical elements for an integrated compact optical microelectromechanical system laser scanner Wendt JR, Krygowski TW, Vawter GA, Blum O, Sweatt WC, Warren ME, Reyes D Journal of Vacuum Science & Technology B, 18(6), 3608, 2000 |
| 2 |
Reactive ion beam etching of GaAs and related compounds in an inductively coupled plasma of Cl-2-Ar mixture Hahn YB, Lee JW, Vawter GA, Shul RJ, Abernathy CR, Hays DC, Lambers ES, Pearton SJ Journal of Vacuum Science & Technology B, 17(2), 366, 1999 |
| 3 |
High-aspect-ratio nanophotonic components fabricated by Cl-2 reactive ion beam etching Zubrzycki WJ, Vawter GA, Wendt JR Journal of Vacuum Science & Technology B, 17(6), 2740, 1999 |
| 4 |
Subwavelength, binary lenses at infrared wavelengths Wendt JR, Vawter GA, Smith RE, Warren ME Journal of Vacuum Science & Technology B, 15(6), 2946, 1997 |
| 5 |
Fabrication of Subwavelength, Binary, Antireflection Surface-Relief Structures in the Near-Infrared Wendt JR, Vawter GA, Smith RE, Warren ME Journal of Vacuum Science & Technology B, 14(6), 4096, 1996 |
| 6 |
A Study of P-Type Ohmic Contacts to InAlAs/InGaAs Heterostructures Briggs RD, Howard AJ, Baca AG, Hafich MJ, Vawter GA Thin Solid Films, 290-291, 508, 1996 |
| 7 |
Nanofabrication of Subwavelength, Binary, High-Efficiency Diffractive Optical-Elements in GaAs Wendt JR, Vawter GA, Smith RE, Warren ME Journal of Vacuum Science & Technology B, 13(6), 2705, 1995 |
| 8 |
Investigation of Plasma Etch Induced Damage in Compound Semiconductor-Devices Shul RJ, Lovejoy ML, Hetherington DL, Rieger DJ, Vawter GA, Klem JF, Melloch MR Journal of Vacuum Science & Technology A, 12(4), 1351, 1994 |
| 9 |
Improved Epitaxial Layer Design for Real-Time Monitoring of Dry-Etching in III-V Compound Heterostructures with Depth Accuracy of +/-8 nm Vawter GA, Klem JF, Leibenguth RE Journal of Vacuum Science & Technology A, 12(4), 1973, 1994 |
| 10 |
Reactive-Ion-Beam Etching of InP in a Chlorine-Hydrogen Mixture Vawter GA, Ashby CI Journal of Vacuum Science & Technology B, 12(6), 3374, 1994 |