화학공학소재연구정보센터
검색결과 : 3건
No. Article
1 Study of ion and vacuum ultraviolet-induced effects on styrene- and ester-based polymers exposed to argon plasma
Bruce RL, Engelmann S, Lin T, Kwon T, Phaneuf RJ, Oehrlein GS, Long BK, Willson CG, Vegh JJ, Nest D, Graves DB, Alizadeh A
Journal of Vacuum Science & Technology B, 27(3), 1142, 2009
2 Silicon etch in the presence of a fluorocarbon overlayer: The role of fluorocarbon cluster ejection
Vegh JJ, Humbird D, Graves DB
Journal of Vacuum Science & Technology A, 26(1), 52, 2008
3 Silicon etch by fluorocarbon and argon plasmas in the presence of fluorocarbon films
Vegh JJ, Humbird D, Graves DB
Journal of Vacuum Science & Technology A, 23(6), 1598, 2005