검색결과 : 5건
| No. | Article |
|---|---|
| 1 |
Negative-Ions in a Ccl2F2 Radio-Frequency Discharge Stoffels E, Stoffels WW, Vender D, Kroesen GM, Dehoog FJ Journal of Vacuum Science & Technology A, 13(4), 2051, 1995 |
| 2 |
Fluorocarbon High-Density Plasmas .1. Fluorocarbon Film Deposition and Etching Using CF4 and Chf3 Oehrlein GS, Zhang Y, Vender D, Haverlag M Journal of Vacuum Science & Technology A, 12(2), 323, 1994 |
| 3 |
Fluorocarbon High-Density Plasmas .2. Silicon Dioxide and Silicon Etching Using CF4 and Chf3 Oehrlein GS, Zhang Y, Vender D, Joubert O Journal of Vacuum Science & Technology A, 12(2), 333, 1994 |
| 4 |
Investigation of Selective SiO2-to-Si Etching in an Inductively-Coupled High-Density Plasma Using Fluorocarbon Gases Bell FH, Joubert O, Oehrlein GS, Zhang Y, Vender D Journal of Vacuum Science & Technology A, 12(6), 3095, 1994 |
| 5 |
Sidewall Passivation During the Etching of Poly-Si in an Electron-Cyclotron-Resonance Plasma of HBr Haverlag M, Oehrlein GS, Vender D Journal of Vacuum Science & Technology B, 12(1), 96, 1994 |