화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 A new MOVPE reactor for heteroepitaxial GaAs deposition on large-scale Ge substrates
Pelosi C, Attolini G, Bosi M, Moscatelli D, Veneroni A, Masi M
Journal of Crystal Growth, 287(2), 652, 2006
2 Materials computation towards technological impact: The multiscale approach to thin films deposition
Cavallotti C, Di Stanislao M, Moscatelli D, Veneroni A
Electrochimica Acta, 50(23), 4566, 2005
3 Epitaxial deposition of silicon carbide films in a horizontal hotwall CVD reactor
Veneroni A, Omarini F, Masi M, Leone S, Mauceri M, Pistone G, Abbondanza G
Materials Science Forum, 483, 57, 2005
4 New achievements on CVD based methods for SIC epitaxial growth
Crippa D, Valente GL, Ruggiero A, Neri L, Reitano R, Calcagno L, Foti G, Mauceri M, Leone S, Pistone G, Abbondanza G, Abbagnale G, Veneroni A, Omarini F, Zamolo L, Masi M, Roccaforte F, Giannazzo F, Di Franco S, La Via F
Materials Science Forum, 483, 67, 2005
5 A combined three-dimensional kinetic Monte Carlo and quantum chemistry study of the CVD of Si on Si(100) surfaces
Cavallotti C, Barbato A, Veneroni A
Journal of Crystal Growth, 266(1-3), 371, 2004