화학공학소재연구정보센터
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No. Article
1 Study of porogen removal by atomic hydrogen generated by hot wire chemical vapor deposition for the fabrication of advanced low-k thin films
Godavarthi S, Wang C, Verdonck P, Matsumoto Y, Koudriavtsev I, Dutt A, Tielens H, Baklanov MR
Thin Solid Films, 575, 103, 2015
2 Impact of Plasma Pretreatment and Pore Size on the Sealing of Ultra-Low-k Dielectrics by Self-Assembled Monolayers
Sun YT, Krishtab M, Struyf H, Verdonck P, De Feyter S, Baklanov MR, Armini S
Langmuir, 30(13), 3832, 2014
3 Effect of ultraviolet curing wavelength on low-k dielectric material properties and plasma damage resistance
Marsik P, Urbanowicz AM, Verdonck P, De Roest D, Sprey H, Baklanov MR
Thin Solid Films, 519(11), 3619, 2011
4 Influence of the ion bombardment of O-2 plasmas on low-k materials
Verdonck P, Samara V, Goodyear A, Ferchichi A, Van Besien E, Baklanov MR, Braithwaite N
Thin Solid Films, 520(1), 464, 2011
5 Effects of He Plasma Pretreatment on Low-k Damage during Cu Surface Cleaning with NH3 Plasma
Urbanowicz AM, Shamiryan D, Zaka A, Verdonck P, De Gendt S, Baklanov MR
Journal of the Electrochemical Society, 157(5), H565, 2010
6 Porogen residues detection in optical properties of low-k dielectrics cured by ultraviolet radiation
Marsik P, Verdonck P, De Roest D, Baklanov MR
Thin Solid Films, 518(15), 4266, 2010
7 Modeling Fluid Flow Through Irregular Scaffolds for Perfusion Bioreactors
Maes F, Ransbeeck P, Van Oosterwyck H, Verdonck P
Biotechnology and Bioengineering, 103(3), 621, 2009
8 Deposition of silicon oxynitride at room temperature by Inductively Coupled Plasma-CVD
Zambom LDS, Verdonck P
Thin Solid Films, 515(2), 596, 2006
9 Blue cooperative luminescence properties in Yb3+ doped GeO2-PbO-Bi2O3 vitreous system for the production of thin films
Cacho VD, Kassab LRP, Oliveira SL, Mansano RD, Verdonck P
Thin Solid Films, 515(2), 764, 2006
10 Plasma etching of electrospun polymeric nanofibres
Verdonck P, Caliope PB, Hernandez ED, da Silva ANR
Thin Solid Films, 515(2), 831, 2006