화학공학소재연구정보센터
검색결과 : 5건
No. Article
1 Wet cleaning of cross-contamination of high-k dielectrics in plasma etch tool
Pandit V, Parks HG, Vermeire B, Raghavan S
Journal of the Electrochemical Society, 153(11), G970, 2006
2 Reduction of surface roughening due to copper contamination prior to ultra-thin gate oxidation
Peterson CA, Vermeire B, Sarid D, Parks HG
Applied Surface Science, 181(1-2), 28, 2001
3 Effects of moisture on Fowler-Nordheim characterization of thin silicon-oxide films
Peterson CA, Workman RK, Sarid D, Vermeire B, Parks HG, Adderton D, Maivald P
Journal of Vacuum Science & Technology A, 17(5), 2753, 1999
4 A comparative electrchemical study of copper deposition onto silicon from dilute and buffered hydrofluoric acids
Li G, Kneer EA, Vermeire B, Parks HG, Raghavan S, Jeon JS
Journal of the Electrochemical Society, 145(1), 241, 1998
5 Electrochemical impedance spectroscopy of copper deposition on silicon from dilute hydrofluoric acid solutions
Cheng X, Li G, Kneer EA, Vermeire B, Parks HG, Raghavan S, Jeon JS
Journal of the Electrochemical Society, 145(1), 352, 1998