| 1 |
Very high frequency plasma reactant for atomic layer deposition
Oh IK, Yoo G, Yoon CM, Kim TH, Yeom GY, Kim K, Lee Z, Jung H, Lee CW, Kim H, Lee HBR
Applied Surface Science, 387, 109, 2016 |
| 2 |
Crystallinity of silicon films grown on carbon fibers by very high frequency plasma enhanced chemical vapor deposition
Chae E, Lee K, Lee H, Ko D, Jeong H, Sohn H
Thin Solid Films, 591, 137, 2015 |
| 3 |
Simulation of spatial characteristics of very high frequency hydrogen plasma produced by a balanced power feeding
Ogiwara K, Chen WT, Uchino K, Kawai Y
Thin Solid Films, 547, 132, 2013 |
| 4 |
Silicon Oxide Coatings with Very High Rates (> 10 nm/s) by Hexamethyldisiloxane-Oxygen Fed Atmospheric-Pressure VHF Plasma: Film-Forming Behavior Using Cylindrical Rotary Electrode
Kakiuchi H, Ohmi H, Yamada T, Yokoyama K, Okamura K, Yasutake K
Plasma Chemistry and Plasma Processing, 32(3), 533, 2012 |
| 5 |
Design of automatic matching system for very high frequency plasma-enhanced processes
Yoshizako Y, Matsuno D
Materials Science Forum, 512, 239, 2006 |
| 6 |
In situ hydrogen plasma treatment for improved transport of (400) oriented polycrystalline silicon films
Suemasu A, Nakahata K, Ro K, Kamiya T, Fortmann CM, Shimizu I
Solar Energy Materials and Solar Cells, 66(1-4), 313, 2001 |
| 7 |
Structure and transport properties of p-type polycrystalline silicon fabricated from fluorinated source gas
Kamiya T, Nakahata K, Ro K, Shimizu I
Thin Solid Films, 394(1-2), 230, 2001 |
