검색결과 : 2건
| No. | Article |
|---|---|
| 1 |
Characteristics of a plasma information variable in phenomenology-based, statistically-tuned virtual metrology to predict silicon dioxide etching depth Jang YC, Roh HJ, Park S, Jeong S, Ryu S, Kwon JW, Kim NK, Kim GH Current Applied Physics, 19(10), 1068, 2019 |
| 2 |
An integrated advanced process control framework using run-to-run control, virtual metrology and fault detection Fan SKS, Chang YJ Journal of Process Control, 23(7), 933, 2013 |