화학공학소재연구정보센터
검색결과 : 11건
No. Article
1 Interactions in Swiss households' energy demand: A holistic approach
Tilov I, Farsi M, Volland B
Energy Policy, 128, 136, 2019
2 Parallel proximal probe arrays with vertical interconnections
Sarov Y, Frank A, Ivanov T, Zollner JP, Ivanova K, Volland B, Rangelow IW, Brogan A, Wilson R, Zawierucha P, Zielony M, Gotszalk T, Nikolov N, Zier M, Schmidt B, Kostic I
Journal of Vacuum Science & Technology B, 27(6), 3132, 2009
3 Nanostructuring of Mo/Si multilayers by means of reactive ion etching using a three-level mask
Dreeskornfeld L, Haindl G, Kleineberg U, Heinzmann U, Shi F, Volland B, Rangelow IW, Majkova E, Luby S, Kostic, Matay L, Hrkut P, Hudek P, Lee HY
Thin Solid Films, 458(1-2), 227, 2004
4 Heavy ion projection beam system for material modification at high ion energy
Weidenmuller U, Meijer J, Stephan A, Bukow HH, Sossna E, Volland B, Rangelow IW
Journal of Vacuum Science & Technology B, 20(1), 246, 2002
5 Field emission arrays by silicon micromachining
Debski T, Volland B, Barth W, Shi F, Hudek P, Rangelow IW, Grabiec P, Studzinska K, Zaborowski M, Mitura S
Journal of Vacuum Science & Technology B, 18(2), 896, 2000
6 Fabrication of open stencil masks with asymmetric void ratio for the ion projection lithography space charge experiment
Volland B, Shi F, Heerlein H, Rangelow IW, Hudek P, Kostic I, Cekan E, Vonach H, Loeschner H, Horner C, Stengl G, Buschbeck H, Zeininger M, Bleeker A, Benschop J
Journal of Vacuum Science & Technology B, 18(6), 3202, 2000
7 Dry etching with gas chopping without rippled sidewalls
Volland B, Hudek FS, Heerlein H, Rangelow IW
Journal of Vacuum Science & Technology B, 17(6), 2768, 1999
8 Experimental results of the stochastic Coulomb interaction in ion projection lithography
de Jager PWH, Derksen G, Mertens B, Cekan E, Lammer G, Vonach H, Buschbeck H, Zeininger M, Horner C, Loschner H, Stengl G, Bleeker AJ, Benschop J, Shi F, Volland B, Hudek P, Heerlein H, Rangelow IW, Kaesmaier R
Journal of Vacuum Science & Technology B, 17(6), 3098, 1999
9 Comparison of silicon stencil mask distortion measurements with finite element analysis
Ehrmann A, Struck T, Chalupka A, Haugeneder E, Loschner H, Butschke J, Irmscher M, Letzkus F, Springer R, Degen A, Rangelow IW, Shi F, Sossna E, Volland B, Engelstad R, Lovell E, Tejeda R
Journal of Vacuum Science & Technology B, 17(6), 3107, 1999
10 Micromachined ultrasharp silicon and diamond-coated silicon tip as a stable field-emission electron source and a scanning probe microscopy sensor with atomic sharpness
Rangelow IW, Shi F, Hudek P, Grabiec P, Volland B, Givargizov EI, Stepanova AN, Obolenskaya LN, Mashkova ES, Molchanov VA
Journal of Vacuum Science & Technology B, 16(6), 3185, 1998