검색결과 : 2건
No. | Article |
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1 |
Some peculiarities of resist-profile simulation for positive-tone chemically amplified resists in electron-beam lithography Vutova K, Koleva E, Mladenov G, Kostic I Journal of Vacuum Science & Technology B, 27(1), 52, 2009 |
2 |
Numerical modelling of the processes of exposure and development in electron beam lithography on high-temperature super-conductor thin films Gueorguiev Y, Vutova K, Mladenov G Thin Solid Films, 323(1-2), 222, 1998 |